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Characterisation of the silicon nitride thin films deposited by plasmamagnetron

dc.contributor.authorBatan, A
dc.contributor.authorFranquet, Alexis
dc.contributor.authorVereecken, Jean
dc.contributor.authorReniers, Francois
dc.date.accessioned2021-10-17T06:15:31Z
dc.date.available2021-10-17T06:15:31Z
dc.date.issued2008
dc.identifier.issn0142-2421
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13347
dc.sourceIIOimport
dc.titleCharacterisation of the silicon nitride thin films deposited by plasmamagnetron
dc.typeJournal article
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.source.peerreviewyes
dc.source.beginpage754
dc.source.endpage757
dc.source.journalSurface and Interface Analysis
dc.source.issue3_4
dc.source.volume40
imec.availabilityPublished - imec


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