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Contact layer printing at 0.28k1 by means of double line exposure and negative tone development

dc.contributor.authorBekaert, Joost
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorReybrouck, Mario
dc.date.accessioned2021-10-17T06:16:26Z
dc.date.available2021-10-17T06:16:26Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13363
dc.sourceIIOimport
dc.titleContact layer printing at 0.28k1 by means of double line exposure and negative tone development
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorReybrouck, Mario
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - open access
imec.internalnotese-proceedings


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