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CMOS 32nm technology node: business as usual for interconnect damascene patterning?

dc.contributor.authorBeyer, Gerald
dc.contributor.authorCiofi, Ivan
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorCarbonell, Laure
dc.contributor.authorVersluijs, Janko
dc.contributor.authorWiaux, Vincent
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorStruyf, Herbert
dc.contributor.authorHendrickx, Dirk
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorVereecke, Guy
dc.contributor.authorClaes, Martine
dc.contributor.authorBearda, Twan
dc.contributor.authorVolders, Henny
dc.contributor.authorHeylen, Nancy
dc.contributor.authorTravaly, Youssef
dc.contributor.authorStucchi, Michele
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCartuyvels, Rudi
dc.date.accessioned2021-10-17T06:17:36Z
dc.date.available2021-10-17T06:17:36Z
dc.date.issued2008-12
dc.identifier.issn1355-8633
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13380
dc.sourceIIOimport
dc.titleCMOS 32nm technology node: business as usual for interconnect damascene patterning?
dc.typeJournal article
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorHendrickx, Dirk
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorVolders, Henny
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCartuyvels, Rudi
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage70
dc.source.endpage77
dc.source.journalSemiconductor Fabtech
dc.source.volume38
imec.availabilityPublished - open access


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