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Prediction of scratch generation in chemical mechanical planarization

dc.contributor.authorChandra, A.
dc.contributor.authorKarra, P.
dc.contributor.authorBastawros, A.F.
dc.contributor.authorBiswas, R.
dc.contributor.authorSherman, P J.
dc.contributor.authorArmini, Silvia
dc.contributor.authorLucca, D.A.
dc.date.accessioned2021-10-17T06:28:29Z
dc.date.available2021-10-17T06:28:29Z
dc.date.issued2008
dc.identifier.issn0007-8506
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13494
dc.sourceIIOimport
dc.titlePrediction of scratch generation in chemical mechanical planarization
dc.typeJournal article
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewyes
dc.source.beginpage559
dc.source.endpage562
dc.source.journalCIRP Annals. Manufacturing Technology
dc.source.issue1
dc.source.volume47
imec.availabilityPublished - imec


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