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dc.contributor.authorChang, Shou-Zen
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorYu, HongYu
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorRohr, Erika
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorKaczer, Ben
dc.contributor.authorDelabie, Annelies
dc.contributor.authorFavia, Paola
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorKubicek, Stefan
dc.contributor.authorSchram, Tom
dc.contributor.authorWitters, Thomas
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorWang, Xin Peng
dc.contributor.authorCho, Hag-Ju
dc.contributor.authorMueller, Markus
dc.contributor.authorChiarella, Thomas
dc.contributor.authorAbsil, Philippe
dc.contributor.authorBiesemans, Serge
dc.date.accessioned2021-10-17T06:29:02Z
dc.date.available2021-10-17T06:29:02Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13498
dc.sourceIIOimport
dc.titleLow VT metal-gate/high-k nMOSFETs - PBTI dependence and VT tune-ability on La/Dy-capping layer locations and laser annealing conditions
dc.typeProceedings paper
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage62
dc.source.endpage63
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate17/06/2008
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


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