Approaching Fermi level unpinning in oxide-In0.2Ga0.8As
dc.contributor.author | Chiang, T.H. | |
dc.contributor.author | Lee, W.C. | |
dc.contributor.author | Lin, T.D. | |
dc.contributor.author | Lin, Dennis | |
dc.contributor.author | Shiu, K.H. | |
dc.contributor.author | Kwo, J. | |
dc.contributor.author | Wang, W.E. | |
dc.contributor.author | Tsai, W. | |
dc.contributor.author | Hong, M. | |
dc.date.accessioned | 2021-10-17T06:31:30Z | |
dc.date.available | 2021-10-17T06:31:30Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13517 | |
dc.source | IIOimport | |
dc.title | Approaching Fermi level unpinning in oxide-In0.2Ga0.8As | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Lin, Dennis | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 375 | |
dc.source.endpage | 378 | |
dc.source.conference | IEEE International Electron Devices Meeting - IEDM | |
dc.source.conferencedate | 15/12/2008 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access |