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Influence of the highly-doped drain implantation and the window size on defect creation in p/n Si1-xGex source/drain junctions
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Authors
Chowdhury, Mohammad Kamruzzaman
;
Vissouvanadin Soubaretty, Bertrand
;
Bargallo Gonzalez, Mireia
;
Bhouri, Nada
;
Verheyen, Peter
;
Hikavyy, Andriy
;
Richard, Olivier
;
Geypen, Jef
;
Bender, Hugo
;
Loo, Roger
;
Claeys, Cor
;
Simoen, Eddy
;
Machkaoutsan, Vladimir
;
Tomasini, P.
;
Thomas, S.G.
;
Lu, J.P.
;
Weijtmans, J.W.
;
Wise, R.
Conference
Gettering and Defect Engineering in Semiconductor Technology XII
Title
Influence of the highly-doped drain implantation and the window size on defect creation in p/n Si1-xGex source/drain junctions
Publication type
Proceedings paper
Embargo date
9999-12-31
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