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Photoresist characterization and wet strip after low-k dry etch

dc.contributor.authorClaes, Martine
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKeldermans, J.
dc.contributor.authorKesters, Els
dc.contributor.authorLux, Marcel
dc.contributor.authorFranquet, Alexis
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorFrank, Martin M.
dc.contributor.authorCarleer, R.
dc.contributor.authorAdriaensens, P.
dc.contributor.authorVanderzande, Dirk
dc.date.accessioned2021-10-17T06:33:24Z
dc.date.available2021-10-17T06:33:24Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13530
dc.sourceIIOimport
dc.titlePhotoresist characterization and wet strip after low-k dry etch
dc.typeProceedings paper
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVanderzande, Dirk
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage325
dc.source.endpage328
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 134


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