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Physical characterization of the metal/high-k layer interaction upon annealing

dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorReading, M.
dc.contributor.authorVan den berg, J.
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorSchram, Tom
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-17T06:36:38Z
dc.date.available2021-10-17T06:36:38Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13552
dc.sourceIIOimport
dc.titlePhysical characterization of the metal/high-k layer interaction upon annealing
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage433
dc.source.endpage442
dc.source.conferencePhysics and Technology of High-k Dielectrics 6
dc.source.conferencedate12/10/2008
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 16, Issue 5


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