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Physico-chemical characterization of thin oxide films: difficulties and solutions

dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-17T06:37:03Z
dc.date.available2021-10-17T06:37:03Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13555
dc.sourceIIOimport
dc.titlePhysico-chemical characterization of thin oxide films: difficulties and solutions
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.beginpage1073-H05-01
dc.source.conferenceMaterials Science of High-k Dielectric Stacks. From Fundamentals to Technology
dc.source.conferencedate24/03/2008
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMaterials Research Society Symposium Proceedings; Vol. 1073E


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