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Replacing SiO2 - Material and processing aspects of new dielectrics

dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorDelabie, Annelies
dc.contributor.authorNyns, Laura
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-17T06:43:50Z
dc.date.available2021-10-17T06:43:50Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13599
dc.sourceIIOimport
dc.titleReplacing SiO2 - Material and processing aspects of new dielectrics
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage3
dc.source.endpage13
dc.source.conferenceDielectrics for Nanosystems 3: Materials Science, Processing, Reliability, and Manufacturing
dc.source.conferencedate19/05/2008
dc.source.conferencelocationPhoenix, AZ USA
dc.identifier.urlwww.electrochem.org
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 13, 2


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