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Scaling of floating gate electrode for sub-40nm flash technologies

dc.contributor.authorDe Vos, Joeri
dc.contributor.authorWellekens, Dirk
dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorVan Aerde, Steven
dc.contributor.authorFischer, Pamela
dc.contributor.authorZagwijn, Peter
dc.date.accessioned2021-10-17T06:47:59Z
dc.date.available2021-10-17T06:47:59Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13625
dc.sourceIIOimport
dc.titleScaling of floating gate electrode for sub-40nm flash technologies
dc.typeProceedings paper
dc.contributor.imecauthorDe Vos, Joeri
dc.contributor.imecauthorWellekens, Dirk
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorVan Aerde, Steven
dc.contributor.orcidimecDe Vos, Joeri::0000-0002-9332-9336
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage123
dc.source.endpage125
dc.source.conference38th European Solid-State Device Research Conference - ESSDERC
dc.source.conferencedate15/09/2008
dc.source.conferencelocationEdingburgh UK
imec.availabilityPublished - open access


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