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Review of reliability issues in high k/metal gate stacks

dc.contributor.authorDegraeve, Robin
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorKaczer, Ben
dc.contributor.authorRoussel, Philippe
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorSahhaf, Sahar
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-17T06:50:38Z
dc.date.available2021-10-17T06:50:38Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13641
dc.sourceIIOimport
dc.titleReview of reliability issues in high k/metal gate stacks
dc.typeProceedings paper
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorSahhaf, Sahar
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage239
dc.source.endpage244
dc.source.conference15th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits - IPFA
dc.source.conferencedate7/07/2008
dc.source.conferencelocationSingapore
imec.availabilityPublished - open access


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