dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Alian, AliReza | |
dc.contributor.author | Bellenger, Florence | |
dc.contributor.author | Brammertz, Guy | |
dc.contributor.author | Brunco, David | |
dc.contributor.author | Caymax, Matty | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Franquet, Alexis | |
dc.contributor.author | Houssa, Michel | |
dc.contributor.author | Sioncke, Sonja | |
dc.contributor.author | Van Elshocht, Sven | |
dc.contributor.author | van Hemmen, J.L. | |
dc.contributor.author | Keuning, W. | |
dc.contributor.author | Kessels, W.M.M. | |
dc.contributor.author | Afanas'ev, V.V. | |
dc.contributor.author | Stesmans, Andre | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Meuris, Marc | |
dc.date.accessioned | 2021-10-17T06:51:54Z | |
dc.date.available | 2021-10-17T06:51:54Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13648 | |
dc.source | IIOimport | |
dc.title | Atomic layer deposition of high-k dielectric layers on Ge and III-V MOS channels | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Alian, AliReza | |
dc.contributor.imecauthor | Brammertz, Guy | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Franquet, Alexis | |
dc.contributor.imecauthor | Houssa, Michel | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.imecauthor | Stesmans, Andre | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.orcidimec | Brammertz, Guy::0000-0003-1404-7339 | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.contributor.orcidimec | Franquet, Alexis::0000-0002-7371-8852 | |
dc.contributor.orcidimec | Houssa, Michel::0000-0003-1844-3515 | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 671 | |
dc.source.endpage | 685 | |
dc.source.conference | SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices | |
dc.source.conferencedate | 12/10/2008 | |
dc.source.conferencelocation | Honolulu, HI Hawai | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 16, Issue 10 | |