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Atomic layer deposition of hafnium oxide on Ge and GaAs substrates: precursors and surface preparation

dc.contributor.authorDelabie, Annelies
dc.contributor.authorBrunco, David
dc.contributor.authorConard, Thierry
dc.contributor.authorFavia, Paola
dc.contributor.authorBender, Hugo
dc.contributor.authorFranquet, Alexis
dc.contributor.authorSioncke, Sonja
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHeyns, Marc
dc.contributor.authorMeuris, Marc
dc.contributor.authorKim, Eunji
dc.contributor.authorMcIntyre, Paul C.
dc.contributor.authorSaraswat, Krishna C.
dc.contributor.authorLeBeau, James M.
dc.contributor.authorCagnon, Joel
dc.contributor.authorStemmer, Susanne
dc.contributor.authorTsai, Wilman
dc.date.accessioned2021-10-17T06:52:09Z
dc.date.available2021-10-17T06:52:09Z
dc.date.issued2008
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13649
dc.sourceIIOimport
dc.titleAtomic layer deposition of hafnium oxide on Ge and GaAs substrates: precursors and surface preparation
dc.typeJournal article
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageH937
dc.source.endpageH944
dc.source.journalJournal of the Electrochemical Society
dc.source.issue12
dc.source.volume155
imec.availabilityPublished - open access


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