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Atomic layer deposition of hafnium oxide on Ge and GaAs substrates: precursors and surface preparation
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Atomic layer deposition of hafnium oxide on Ge and GaAs substrates: precursors and surface preparation
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Date
2008
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Delabie, Annelies
;
Brunco, David
;
Conard, Thierry
;
Favia, Paola
;
Bender, Hugo
;
Franquet, Alexis
;
Sioncke, Sonja
;
Vandervorst, Wilfried
;
Van Elshocht, Sven
;
Heyns, Marc
;
Meuris, Marc
;
Kim, Eunji
;
McIntyre, Paul C.
;
Saraswat, Krishna C.
;
LeBeau, James M.
;
Cagnon, Joel
;
Stemmer, Susanne
;
Tsai, Wilman
Journal
Journal of the Electrochemical Society
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1989
since deposited on 2021-10-17
2
last month
Acq. date: 2026-01-11
Citations
Metrics
Views
1989
since deposited on 2021-10-17
2
last month
Acq. date: 2026-01-11
Citations