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The importance of H-passivation for low-temperature APCVD silicon epitaxy
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Authors
Mouche, M.J.
;
Caymax, Matty
;
Bender, Hugo
;
Storm, Wolfgang
;
Vandervorst, Wilfried
Conference
Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
Title
The importance of H-passivation for low-temperature APCVD silicon epitaxy
Publication type
Proceedings paper
Embargo date
9999-12-31
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