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Impact of rapid thermal annealing of Ti/TiN bilayers on subsequent chemical vapor deposition of tungsten

dc.contributor.authorMouroux, Aliette
dc.contributor.authorPalmans, Roger
dc.contributor.authorKeinonen, J.
dc.contributor.authorZhang, S. L.
dc.contributor.authorMaex, Karen
dc.contributor.authorPetersson, S.
dc.date.accessioned2021-09-29T15:14:06Z
dc.date.available2021-09-29T15:14:06Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1367
dc.sourceIIOimport
dc.titleImpact of rapid thermal annealing of Ti/TiN bilayers on subsequent chemical vapor deposition of tungsten
dc.typeProceedings paper
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage365
dc.source.endpage370
dc.source.conferenceAdvanced Metallization for Future ULSI
dc.source.conferencedate8/04/1996
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 427


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