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Plasma modification of Si-O-Si bond structure in porous SiOCH films

dc.contributor.authorDultsev, F.N.
dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-17T06:58:04Z
dc.date.available2021-10-17T06:58:04Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13681
dc.sourceIIOimport
dc.titlePlasma modification of Si-O-Si bond structure in porous SiOCH films
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageN7.3-03
dc.source.conferenceMaterials and Processes for Advanced Interconnects for Microelectronics
dc.source.conferencedate24/03/2008
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 1079E


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