dc.contributor.author | Everaert, Jean-Luc | |
dc.contributor.author | Zschaetzsch, Gerd | |
dc.contributor.author | Vecchio, Emma | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Cunnane, Liam | |
dc.date.accessioned | 2021-10-17T07:03:37Z | |
dc.date.available | 2021-10-17T07:03:37Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13710 | |
dc.source | IIOimport | |
dc.title | Plasma doping control by mass metrology | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Everaert, Jean-Luc | |
dc.contributor.imecauthor | Vecchio, Emma | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.source.peerreview | no | |
dc.source.beginpage | 113 | |
dc.source.endpage | 116 | |
dc.source.conference | 16th Annual IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP | |
dc.source.conferencedate | 30/09/2008 | |
dc.source.conferencelocation | Las Vegas, NV USA | |
imec.availability | Published - imec | |