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Implementation of molecular ion implant technology for PMOS extension

dc.contributor.authorFalepin, Annelies
dc.contributor.authorCollart, Erik
dc.contributor.authorTran, Sandra
dc.contributor.authorHarris, Mark
dc.contributor.authorAmeen, Mike
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorRosseel, Erik
dc.contributor.authorSaino, Kanto
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorAbsil, Philippe
dc.date.accessioned2021-10-17T07:04:21Z
dc.date.available2021-10-17T07:04:21Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13714
dc.sourceIIOimport
dc.titleImplementation of molecular ion implant technology for PMOS extension
dc.typeProceedings paper
dc.contributor.imecauthorFalepin, Annelies
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage46
dc.source.endpage48
dc.source.conference8th International Workshop on Junction Technology - IWJT
dc.source.conferencedate15/05/2008
dc.source.conferencelocationShangai China
imec.availabilityPublished - open access


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