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Double patterning for 32-nm and below: an update

dc.contributor.authorFinders, Jo
dc.contributor.authorDusa, Mircea
dc.contributor.authorVleeming, Bert
dc.contributor.authorHepp, Birgitt
dc.contributor.authorMegens, Henry
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorCheng, Shaunee
dc.contributor.authorVandeweyer, Tom
dc.date.accessioned2021-10-17T07:06:20Z
dc.date.available2021-10-17T07:06:20Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13724
dc.sourceIIOimport
dc.titleDouble patterning for 32-nm and below: an update
dc.typeProceedings paper
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorVandeweyer, Tom
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage692408
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6924


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