Show simple item record

Physical characterization of ALD Al2O3 films deposited on GaAs substrates

dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorSioncke, Sonja
dc.contributor.authorCaymax, Matty
dc.contributor.authorDelabie, Annelies
dc.contributor.authorHeyns, Marc
dc.contributor.authorMeuris, Marc
dc.contributor.authorBrammertz, Guy
dc.contributor.authorVan Hemmen, J.L.
dc.contributor.authorKeuning, W
dc.contributor.authorKessels, W.M.M.
dc.date.accessioned2021-10-17T07:08:57Z
dc.date.available2021-10-17T07:08:57Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13737
dc.sourceIIOimport
dc.titlePhysical characterization of ALD Al2O3 films deposited on GaAs substrates
dc.typeMeeting abstract
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorBrammertz, Guy
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecBrammertz, Guy::0000-0003-1404-7339
dc.source.peerreviewno
dc.source.beginpage46
dc.source.conference14th International Conference on Thin Films - ICTF 14
dc.source.conferencedate17/11/2008
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record