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Galvanic corrosion of stacked metal gate electrodes during cleaning in HF solutions

dc.contributor.authorGaraud, Sylvain
dc.contributor.authorVos, Rita
dc.contributor.authorShamiryan, Denis
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorMertens, Paul
dc.contributor.authorFransaer, Jan
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-17T07:11:16Z
dc.date.available2021-10-17T07:11:16Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13748
dc.sourceIIOimport
dc.titleGalvanic corrosion of stacked metal gate electrodes during cleaning in HF solutions
dc.typeProceedings paper
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage87
dc.source.endpage90
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 134


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