dc.contributor.author | Goethals, Mieke | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Baudemprez, Bart | |
dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Laidler, David | |
dc.contributor.author | Niroomand, Ardavan | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | van Dijk, Andre | |
dc.contributor.author | Romijn, Leon | |
dc.contributor.author | Stepanenko, Nickolay | |
dc.contributor.author | Timoshkov, Vadim | |
dc.contributor.author | Iwamoto, Fumio | |
dc.contributor.author | Myers, Alan | |
dc.contributor.author | Hyun, Yoonsuk | |
dc.contributor.author | Lim, Changmoon | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Leeson, Michael | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Demuynck, Steven | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2021-10-17T07:17:38Z | |
dc.date.available | 2021-10-17T07:17:38Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13777 | |
dc.source | IIOimport | |
dc.title | Implementing full field EUV lithography using the ADT | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Baudemprez, Bart | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.imecauthor | Laidler, David | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.contributor.imecauthor | van Dijk, Andre | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.contributor.imecauthor | Demuynck, Steven | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.contributor.orcidimec | Laidler, David::0000-0003-4055-3366 | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | International Symposium on Extreme Ultraviolet Lithography - EUVL | |
dc.source.conferencedate | 28/09/2008 | |
dc.source.conferencelocation | Lake Tahoe, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | e-proceedings | |