Show simple item record

Implementing full field EUV lithography using the ADT

dc.contributor.authorGoethals, Mieke
dc.contributor.authorHendrickx, Eric
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLorusso, Gian
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorHermans, Jan
dc.contributor.authorLaidler, David
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorvan Dijk, Andre
dc.contributor.authorRomijn, Leon
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorTimoshkov, Vadim
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorMyers, Alan
dc.contributor.authorHyun, Yoonsuk
dc.contributor.authorLim, Changmoon
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLeeson, Michael
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDemuynck, Steven
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T07:17:38Z
dc.date.available2021-10-17T07:17:38Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13777
dc.sourceIIOimport
dc.titleImplementing full field EUV lithography using the ADT
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorvan Dijk, Andre
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate28/09/2008
dc.source.conferencelocationLake Tahoe, CA USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings


Files in this item

Thumbnail
Name:
16958.pdf
Size:
3.968Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record