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Resist process development for the EUV alpha demo tool at IMEC

dc.contributor.authorGoethals, Mieke
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorHermans, Jan
dc.contributor.authorLorusso, Gian
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorPollentier, Ivan
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDemuynck, Steven
dc.contributor.authorJonckheere, Rik
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T07:17:52Z
dc.date.available2021-10-17T07:17:52Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13778
dc.sourceIIOimport
dc.titleResist process development for the EUV alpha demo tool at IMEC
dc.typeOral presentation
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Workshop on EUVL
dc.source.conferencedate10/06/2008
dc.source.conferencelocationMaui, HI USA
imec.availabilityPublished - open access


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