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Using KLUP for understanding trends in EUV resist performance

dc.contributor.authorGronheid, Roel
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorVan Steenwinckel, David
dc.date.accessioned2021-10-17T07:27:08Z
dc.date.available2021-10-17T07:27:08Z
dc.date.issued2008
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13819
dc.sourceIIOimport
dc.titleUsing KLUP for understanding trends in EUV resist performance
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVan Roey, Frieda
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage429
dc.source.endpage434
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue3
dc.source.volume21
imec.availabilityPublished - open access


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