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Resolution - line width roughness - sensitivity trade-offs in photoresists for advanced lithography

dc.contributor.authorGronheid, Roel
dc.contributor.authorVan Steenwinckel, David
dc.date.accessioned2021-10-17T07:27:19Z
dc.date.available2021-10-17T07:27:19Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13820
dc.sourceIIOimport
dc.titleResolution - line width roughness - sensitivity trade-offs in photoresists for advanced lithography
dc.typeOral presentation
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceSemicon Europe 2008
dc.source.conferencedate6/10/2008
dc.source.conferencelocationStuttgart Germany
imec.availabilityPublished - open access


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