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Unusual noise behavior versus temperature in nFinFETs on silicon on insulator (SOI) substrates processed with different strain techniques

dc.contributor.authorGuo, Wei
dc.contributor.authorRoutoure, J.M.
dc.contributor.authorCretu, B.
dc.contributor.authorCarin, R.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorCollaert, Nadine
dc.contributor.authorPut, Sofie
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-17T07:28:55Z
dc.date.available2021-10-17T07:28:55Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13827
dc.sourceIIOimport
dc.titleUnusual noise behavior versus temperature in nFinFETs on silicon on insulator (SOI) substrates processed with different strain techniques
dc.typeProceedings paper
dc.contributor.imecauthorGuo, Wei
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage141
dc.source.endpage142
dc.source.conferenceEUROSOI Workshop Proceedings: 4th Workshop of the Thematic Network on Silicon-on-Insulator Technology, Devices and Circuits
dc.source.conferencedate23/01/2008
dc.source.conferencelocationCork Ireland
imec.availabilityPublished - open access


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