Show simple item record

Full field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles

dc.contributor.authorHendrickx, Eric
dc.contributor.authorGoethals, Mieke
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorLorusso, Gian
dc.contributor.authorHermans, Jan
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T07:36:10Z
dc.date.available2021-10-17T07:36:10Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13856
dc.sourceIIOimport
dc.titleFull field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage714007
dc.source.conferenceSPIE Lithography Asia
dc.source.conferencedate4/11/2008
dc.source.conferencelocationTaipei Taiwan
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings; Vol. 7140


Files in this item

Thumbnail
Name:
17434.pdf
Size:
582.6Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record