Authors

Hikavyy, Andriy; Rooyackers, Rita; Verheyen, Peter; Leys, Frederik; Vellianitis, Georgios; Van Dal, Mark; Lander, Rob; Loo, Roger

Conference

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS. 4: New Materials, Processes, and Equipment

Title

Application of HCl gas phase etch in the production of novel devices

Publication type

Proceedings paper

Embargo date

9999-12-31