dc.contributor.author | Huyghebaert, Cedric | |
dc.contributor.author | Bearda, Twan | |
dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | Everaert, Jean-Luc | |
dc.contributor.author | Don, Eric | |
dc.contributor.author | Pavelka, Tibor | |
dc.date.accessioned | 2021-10-17T07:48:42Z | |
dc.date.available | 2021-10-17T07:48:42Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13908 | |
dc.source | IIOimport | |
dc.title | Use of corona charge photo-conductance decay (charge-PCD) for fast metal contamination monitoring of high temperature processes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Huyghebaert, Cedric | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Everaert, Jean-Luc | |
dc.contributor.orcidimec | Huyghebaert, Cedric::0000-0001-6043-7130 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 397 | |
dc.source.endpage | 401 | |
dc.source.conference | IEEE/SEMI Advanced Semiconductor Manufacturing Conference - ASMC | |
dc.source.conferencedate | 5/05/2008 | |
dc.source.conferencelocation | Boston, MA USA | |
imec.availability | Published - open access | |