dc.contributor.author | Ishimoto, Toru | |
dc.contributor.author | Osaki, M. | |
dc.contributor.author | Sekiguchi, Kohei | |
dc.contributor.author | Hasegawa, N. | |
dc.contributor.author | Watanabe, K. | |
dc.contributor.author | Laidler, David | |
dc.contributor.author | Cheng, Shaunee | |
dc.date.accessioned | 2021-10-17T07:51:03Z | |
dc.date.available | 2021-10-17T07:51:03Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13917 | |
dc.source | IIOimport | |
dc.title | Further study on the verification of CD-SEM based monitoring for hyper NA lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Laidler, David | |
dc.contributor.orcidimec | Laidler, David::0000-0003-4055-3366 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 69222O | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXII | |
dc.source.conferencedate | 24/02/2008 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 6922 | |