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Impact of incorporated Al on the TiN/HfO2 interface effective work function

dc.contributor.authorKa, Xiong
dc.contributor.authorRobertson, John
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorPetry, Jasmine
dc.contributor.authorMüller, Markus
dc.date.accessioned2021-10-17T07:55:23Z
dc.date.available2021-10-17T07:55:23Z
dc.date.issued2008
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13934
dc.sourceIIOimport
dc.titleImpact of incorporated Al on the TiN/HfO2 interface effective work function
dc.typeJournal article
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage74501
dc.source.journalJournal of Applied Physics
dc.source.issue7
dc.source.volume104
imec.availabilityPublished - open access


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