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Investigation of bias-temperature instability in work-function-tuned high-k/metal-gate stacks

dc.contributor.authorKaczer, Ben
dc.contributor.authorVeloso, Anabela
dc.contributor.authorRoussel, Philippe
dc.contributor.authorGrasser, Tibor
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-17T07:55:55Z
dc.date.available2021-10-17T07:55:55Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13936
dc.sourceIIOimport
dc.titleInvestigation of bias-temperature instability in work-function-tuned high-k/metal-gate stacks
dc.typeOral presentation
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.source.peerreviewno
dc.source.conference15th Workshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate23/06/2008
dc.source.conferencelocationBad Saarow Germany
imec.availabilityPublished - imec


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