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Flare mitigation strategies in extreme ultraviolet lithography

dc.contributor.authorKim, Insung
dc.contributor.authorMyers, Alan
dc.contributor.authorMelvin, Lawrence
dc.contributor.authorWard, Brian
dc.contributor.authorLorusso, Gian
dc.contributor.authorJonckheere, Rik
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T07:59:40Z
dc.date.available2021-10-17T07:59:40Z
dc.date.issued2008
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13950
dc.sourceIIOimport
dc.titleFlare mitigation strategies in extreme ultraviolet lithography
dc.typeJournal article
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewyes
dc.source.beginpage738
dc.source.endpage743
dc.source.journalMicroelectronic Engineering
dc.source.issue5_6
dc.source.volume85
imec.availabilityPublished - imec


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