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Cluster optimization to improve total CD control as an enabler for double patterning

dc.contributor.authorLaidler, David
dc.contributor.authorD'have, Koen
dc.contributor.authorRosslee, Craig
dc.contributor.authorTedeschi, Len
dc.date.accessioned2021-10-17T08:06:31Z
dc.date.available2021-10-17T08:06:31Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13975
dc.sourceIIOimport
dc.titleCluster optimization to improve total CD control as an enabler for double patterning
dc.typeProceedings paper
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorD'have, Koen
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - imec
imec.internalnotese-proceedings


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