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X-ray and ToF-SIMS comparison of resistive switching NiO films obtained from controlled Ni thermal oxidation, e-beam and ALD
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X-ray and ToF-SIMS comparison of resistive switching NiO films obtained from controlled Ni thermal oxidation, e-beam and ALD
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lamperti, A.
;
Courtade, Lorene
;
Lisoni, Judit
;
Goux, Ludovic
;
Turquat, C.
;
Spiga, Sabina
;
Muller, Christophe
;
Wouters, Dirk
;
Fanciulli, M.
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Views
2074
since deposited on 2021-10-17
1
last month
1
last week
Acq. date: 2025-12-10
Citations