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Modification of photoresist by UV for post-etch wet strip applications

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorClaes, Martine
dc.contributor.authorLux, Marcel
dc.contributor.authorVereecke, Guy
dc.date.accessioned2021-10-17T08:14:01Z
dc.date.available2021-10-17T08:14:01Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14003
dc.sourceIIOimport
dc.titleModification of photoresist by UV for post-etch wet strip applications
dc.typeOral presentation
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.conference9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate21/09/2008
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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