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Strategies to improve linewidth control for 0.25 µm and 0.18 µm devices

dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorRonse, Kurt
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorBruggeman, B.
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T15:16:08Z
dc.date.available2021-09-29T15:16:08Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1400
dc.sourceIIOimport
dc.titleStrategies to improve linewidth control for 0.25 µm and 0.18 µm devices
dc.typeJournal article
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage399
dc.source.endpage424
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue3
dc.source.volume9
imec.availabilityPublished - open access
imec.internalnotesPaper from the 13th Conference of Photopolymer Science and Technology. June 1996. Tokyo, Japan


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