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Diffraction based overlay metrology in the framework of double patterning

dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-17T08:16:46Z
dc.date.available2021-10-17T08:16:46Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14013
dc.sourceIIOimport
dc.titleDiffraction based overlay metrology in the framework of double patterning
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - open access
imec.internalnotese-proceedings


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