Show simple item record

Diffraction based overlay metrology: accuracy and performance on front end stack

dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorKandel, Daniel
dc.contributor.authorAdel, Mike
dc.contributor.authorMarchelli, Anat
dc.contributor.authorVakshtein, Irina
dc.contributor.authorVasconi, Mauro
dc.contributor.authorSalski, Bartlomiej
dc.date.accessioned2021-10-17T08:17:03Z
dc.date.available2021-10-17T08:17:03Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14014
dc.sourceIIOimport
dc.titleDiffraction based overlay metrology: accuracy and performance on front end stack
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69220O
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXII
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
14684.pdf
Size:
167.5Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record