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Effective metal gate work function modification by ion implantation with W-based gate stack

dc.contributor.authorLi, Zilan
dc.contributor.authorSchram, Tom
dc.contributor.authorKerner, Christoph
dc.contributor.authorWitters, Thomas
dc.contributor.authorSinganamalla, Raghunath
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorRohr, Erika
dc.contributor.authorAbsil, Philippe
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-17T08:22:19Z
dc.date.available2021-10-17T08:22:19Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14032
dc.sourceIIOimport
dc.titleEffective metal gate work function modification by ion implantation with W-based gate stack
dc.typeOral presentation
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference5th International Symposium on Advanced Gate Stack Technology
dc.source.conferencedate28/09/2008
dc.source.conferencelocationAustin, TX USA
imec.availabilityPublished - imec


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