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Imaging performance of the EUV alpha demo tool at IMEC

dc.contributor.authorLorusso, Gian
dc.contributor.authorHermans, Jan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorMyers, Alan
dc.contributor.authorKim, In Sung
dc.contributor.authorKim, Byeong Soo
dc.contributor.authorJonckheere, Rik
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorLok, E.
dc.contributor.authorVan Dijk, A.
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDemuynck, Steven
dc.contributor.authorGoossens, Danny
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T08:32:29Z
dc.date.available2021-10-17T08:32:29Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14066
dc.sourceIIOimport
dc.titleImaging performance of the EUV alpha demo tool at IMEC
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69210O
dc.source.conferenceEmerging Lithographic Technologies XII
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; vol. 6921


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