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Physical design and mask synthesis considerations for DPT

dc.contributor.authorLucas, Kevin
dc.contributor.authorCork, Chris
dc.contributor.authorHapli, John
dc.contributor.authorMiloslavsky, Alex
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVerhaegen, Staf
dc.date.accessioned2021-10-17T08:33:45Z
dc.date.available2021-10-17T08:33:45Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14071
dc.sourceIIOimport
dc.titlePhysical design and mask synthesis considerations for DPT
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - open access
imec.internalnotese-proceedings


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