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Alternative process schemes for double patterning that eliminate the intermediate etch step
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Alternative process schemes for double patterning that eliminate the intermediate etch step
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Date
2008
Proceedings Paper
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14686.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Maenhoudt, Mireille
;
Gronheid, Roel
;
Stepanenko, Nickolay
;
Matsuda, Takashi
;
Vangoidsenhoven, Diziana
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1934
since deposited on 2021-10-17
Acq. date: 2026-01-08
Citations
Metrics
Views
1934
since deposited on 2021-10-17
Acq. date: 2026-01-08
Citations