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Double patterning process development at IMEC

dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorGronheid, Roel
dc.contributor.authorVersluijs, Janko
dc.contributor.authorMiller, Andy
dc.date.accessioned2021-10-17T08:38:25Z
dc.date.available2021-10-17T08:38:25Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14087
dc.sourceIIOimport
dc.titleDouble patterning process development at IMEC
dc.typeOral presentation
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorMiller, Andy
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceSematech Litho Forum
dc.source.conferencedate12/05/2008
dc.source.conferencelocationBolton Landing, NY USA
imec.availabilityPublished - open access


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