Show simple item record

Stripping of ion implanted photoresist by Co2 cryogenic pre-treatment followed by wet cleaning

dc.contributor.authorMalhouitre, Stephane
dc.contributor.authorVos, Rita
dc.contributor.authorBanerjee, Souvik
dc.contributor.authorBearda, Twan
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-17T08:43:20Z
dc.date.available2021-10-17T08:43:20Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14104
dc.sourceIIOimport
dc.titleStripping of ion implanted photoresist by Co2 cryogenic pre-treatment followed by wet cleaning
dc.typeOral presentation
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate22/09/2008
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
17494.pdf
Size:
4.277Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record