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Design and realization of a photolithography alignment and UV exposure equipment for pedagogical and laboratory experiment purposes

dc.contributor.authorMansano, Ronaldo
dc.contributor.authorOrdonez, Nilson
dc.contributor.authorMorimoto, Nilton
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorCarbonne, Bertrand
dc.contributor.authorDanto, Yves
dc.contributor.authorBonnaud, Olivier
dc.date.accessioned2021-10-17T08:46:52Z
dc.date.available2021-10-17T08:46:52Z
dc.date.issued2008
dc.identifier.issn1638-1963
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14116
dc.sourceIIOimport
dc.titleDesign and realization of a photolithography alignment and UV exposure equipment for pedagogical and laboratory experiment purposes
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1033
dc.source.journalJournal sur l'Enseignement des Sciences et Technologies de l'Information et des Systèmes - J3eA
dc.source.volume7
dc.identifier.urlhttp://www.j3ea.org/
imec.availabilityPublished - imec


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