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Increasing the predictability of AIMS measurements by coupling to resist simulations

dc.contributor.authorMeliorisz, Balint
dc.contributor.authorErdmann, Andreas
dc.contributor.authorSchnattinger, Thomas
dc.contributor.authorStrössner, Ulrich
dc.contributor.authorScherübl, Thomas
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorPhilipsen, Vicky
dc.date.accessioned2021-10-17T08:55:39Z
dc.date.available2021-10-17T08:55:39Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14145
dc.sourceIIOimport
dc.titleIncreasing the predictability of AIMS measurements by coupling to resist simulations
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.beginpage70282S
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XV
dc.source.conferencedate16/04/2008
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 7028


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